Global Atomic Layer Deposition (ALD) market is expected to reach USD 9,510.51 Million by 2025, at a CAGR of 26.2% from 2018 to 2025. The key contributing factor for the market growth are increasing use of atomic layer deposition equipment in semiconductor, electronics and energy devices and adoption of new technologies in the ALD equipment.
Market Overview:
Atomic Layer Deposition (ALD) is defined as the chemical process of depositing thin-film layer based on the sequential use of a gas phase mechanism. It is a vapour phase technique which involves exposing the surface of a substrate to alternating precursors so that they do not overlap on each other. It is widely used in the semiconductor manufacturing industry to make electronics small and miniaturized. This technology involves the use of new and highly competitive products transformed into ultra-thin films of a few nanometres deposited in a precisely controlled way. It depends upon self-limiting surface reactions which provides very low pin-hole shape and has wide range of applications in fabrication of semiconductor devices and tools using nanotechnology.
Report Description:
Market Dynamics:
Drivers:
Restraints:
Opportunities:
Challenges:
Global Atomic Layer Deposition (ALD) Market Key Findings:
All the segments have been analysed on global, regional and country basis. The study includes the analysis of more than 30 countries for each segment.
Segmentation Analysis:
The Atomic Layer Deposition (ALD) market is segmented on the basis of type and application.
Regional Segmentation Analysis:
The regions analysed for the market include North America, Europe, South America, Asia Pacific, and Middle East and Africa. Asia Pacific region dominated the global Atomic Layer Deposition (ALD) market with USD 557.53 Million in 2017 where as the North America region held the second dominant position in the market.
Global Atomic Layer Deposition (ALD) market Competitive Analysis:
Key players in the Atomic Layer Deposition (ALD) market are Adeka Corporation, Aixtron SE, Applied Materials, Inc., ASM International NV, Lam Research Corporation, Tokyo Electron Limited, Denton Vacuum, Kurt J. Lesker Company, Beneq Oy, and Veeco Instruments, Tokyo Electron Limited, Canon Anvela Corporation, Picosun Oy, Entergis Inc., and ALD NanoSolutions, Inc.
For instance, in July 2018, in California, ASM International N.V. (Euronext Amsterdam: ASM) launched the Synergis® atomic layer deposition (ALD) tool for advanced-node logic and memory high-volume production applications.
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Scope
Key Points |
Information |
Evaluate Market Potential |
Growth Rates (CAGR %) Value (USD Million) {Market Size} Volume (‘000 Units) |
USP of Report |
Industry and Technology Trends Market Evolution Value Chain Analysis Company Share Analysis Competitive & Vendor landscape SWOT Analysis of Each Company Profit Margin Analysis Analysis of More than 30 Countries for Each Segment |
Base Year |
2017 |
Historical Years |
2015-2017 |
Forecast Period |
2018-2025 |
Regional Analysis |
North America, Europe, Asia Pacific, South America, and Middle East and Africa |
Countries Analysis |
U.S., Canada, Mexico, Germany, France, Sweden, Netherlands, U.K., Italy, Spain, Turkey, Switzerland, Belgium, Japan, China, India, South Korea, Australia, Singapore, Malaysia, Thailand, Indonesia, Philippines, Brazil, Saudi Arabia, UAE, Egypt, Nigeria, South Africa |
This study forecasts revenue and volume growth at global, regional, and country levels from 2015 to 2025. Fior Market Research has segmented the global Atomic Layer Deposition (ALD) market on the basis of below mentioned segments:
Global Atomic Layer Deposition (ALD) market, By Type:
Global Atomic Layer Deposition (ALD) market, By Product:
Global Atomic Layer Deposition (ALD) market, By Regions:
List of Table
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